abstract |
(A) component: resin having a phenolic hydroxyl group, (B) component: an aliphatic or alicyclic epoxy compound having two or more oxirane rings, (C) component: photosensitive acid generator, and (D) component: It is a photosensitive resin composition containing a solvent, Comprising: 20-70 mass parts of said (B) component is contained with respect to 100 mass parts of said (A) component, The photosensitive resin composition characterized by the above-mentioned is provided. |