| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-15 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2019-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2021-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102303833-B1 |
| titleOfInvention |
Resist compound, method of forming pattern using the same, and method of manufacturing semiconductor device using the same |
| abstract |
A resist compound, a pattern forming method using the same, and a semiconductor device manufacturing method are provided. According to the present invention, the compound may be represented by Formula 1 below. [Formula 1] |
| priorityDate |
2019-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |