http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102295525-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2015-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102295525-B1 |
| titleOfInvention | Hard mask composition for spin coating |
| abstract | The present invention relates to a hard mask composition for spin coating, and more particularly, to a graphene copolymer; And it provides a hard mask composition for spin coating comprising a solvent. Since the hardmask composition of the present invention has excellent etching resistance, etching of an increased aspect ratio is possible even with a thin mask. Since a thin hard mask is sufficient, sufficient transparency can be secured, which is advantageous for key alignment, and the material cost is low, so it is economical. |
| priorityDate | 2015-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 295.