Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2221-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2239-0492 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D39-1623 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D201-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-63 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D39-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D201-00 |
filingDate |
2019-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2021-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2021-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102291196-B1 |
titleOfInvention |
A depth filter for filtering CMP slurry and manufacturing method thereof |
abstract |
The filter for CMP slurry filtration according to the present invention coats a hydrophilic polymer on the surface of a nonwoven fabric layer forming the filter, so that particles and gels such as CMP (chemical mechanical planarization) slurry, MLCC (multilayer ceramic capacitor) slurry and photoresist chemicals are coated. It is possible to maximize the filtration effect of the slurry by increasing the affinity with the slurry and composition contained therein, and by lowering the differential pressure applied to the filter. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230129120-A |
priorityDate |
2019-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |