| abstract |
[Project] To provide a resin composition containing a novel polymer, a pattern forming method using the resin composition, and a method for synthesizing the polymer. [Solutions] A resin composition for forming an insulating film comprising a polymer having a structural unit represented by the following formula (1a) and a structural unit represented by the following formula (1b) and an organic solvent. [Wherein, T 0 represents a divalent organic group containing at least one arylene group in which at least one hydrogen atom is substituted with an amino group, and T 1 is a divalent organic group containing at least one arylene group having at least one substituent. A group is represented, and this substituent is represented by the following formula (2): (wherein Z represents a divalent aliphatic group, aromatic group or alicyclic group which may have a substituent.) |