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filingDate 2018-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102269470-B1
titleOfInvention Two-Step Process for Silicon Gap Filling
abstract Methods for seamless gap filling include forming a flowable film by PECVD; treating the flowable film to form a Si—X film, wherein X is C, O, or N; and curing the flowable film or Si-X film to solidify the film. Flowable films can be formed using higher order silanes and plasmas. To coagulate the flowable or Si-X film, UV curing or other curing may be used.
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