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filingDate 2019-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102264071-B1
titleOfInvention Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and program
abstract It improves the quality of the cleaning process in the supply part which supplies the process gas with respect to a board|substrate. (a) supplying a first gas, either a cleaning gas or an additive gas reacting with the cleaning gas, from the supply unit toward the inside of the processing container after the substrate is processed by supplying a processing gas from the supply unit; (b) After stopping the supply of the first gas, a second gas, which is different from the first gas, of the cleaning gas and the additive gas, is supplied toward the inside of the processing container while a part of the first gas remains in the supply unit. , the inside of the supply unit is cleaned by performing a cycle including the step of supplying from the supply unit a predetermined number of times.
priorityDate 2018-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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