http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102264002-B1

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67075
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
filingDate 2018-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102264002-B1
titleOfInvention Substrate processing apparatus, substrate processing method and recording medium
abstract A substrate processing apparatus, a substrate processing method, and a storage medium for shortening the etching processing time are provided. A substrate processing apparatus according to an embodiment includes a substrate processing tank, a mixing unit, and a supply line. The substrate processing tank performs an etching process with an etchant. The mixing unit mixes the new liquid with the silicone-containing compound or the liquid containing the silicone-containing compound. The supply line supplies the mixed solution mixed by the mixing unit to the substrate processing tank.
priorityDate 2017-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 34.