http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102257616-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102257616-B1 |
| titleOfInvention | Method for forming resist pattern, method for processing substrate and photoresist composition |
| abstract | An object of the present invention is to provide a method of forming a resist pattern that can not only improve resist performance, but also can be applied to an existing coating apparatus without lowering productivity, and that can form a resist pattern having a thick film thickness. The solution of the present invention is a resist pattern forming method comprising a step of forming a resist film with a photoresist composition, a step of exposing the resist film, and a step of developing the exposed resist film, wherein the photoresist composition comprises a weight average A polymer having a molecular weight of 1,000 or more and 7,500 or less, and a structural unit containing an acid dissociable group that is dissociated by the action of an acid, a radiation-sensitive acid generator and a solvent, and the photoresist composition has a solid content of 20% by mass It is characterized in that it is more than 60 mass %. The viscosity at 25°C of the photoresist composition is preferably 50 mPa·s or more and 150 mPa·s or less. |
| priorityDate | 2013-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 396.