| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D201-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D201-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 |
| filingDate |
2013-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2021-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102255221-B1 |
| titleOfInvention |
Organic bottom antireflective coating composition for nanolithography |
| abstract |
In the antireflection coating composition of the present invention, by attaching a crosslinking agent to the polymer resin in the composition and minimizing the content of the low molecular weight crosslinking agent in the composition to adjust the thermal curing initiation temperature, the antireflection coating layer is formed by the edge of the substrate pattern Tear can prevent pull-back and further improve the gap-filling performance of the pattern. |
| priorityDate |
2013-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |