http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102249532-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C25-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 |
| filingDate | 2013-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102249532-B1 |
| titleOfInvention | Wet Etching Material Preventing Glass Sludge |
| abstract | The present invention relates to a wet etching solution that suppresses the generation of glass precipitates when etching a silicon oxide film formed on a glass substrate. The composition for wet etching for suppressing the generation of glass precipitates according to the present invention includes hydrogen fluoride (HF), 2 to 5 wt%; Ammonium fluoride (NH 4 F), 10 to 30 wt%; Organic acid additive, 0.5 to 10 wt%; And deionized water (water). |
| priorityDate | 2013-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.