http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102226442-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F30-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F30-04 |
| filingDate | 2016-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102226442-B1 |
| titleOfInvention | Pattern formation method, electronic device manufacturing method, semiconductor device manufacturing process resin manufacturing monomer, resin, resin manufacturing method, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film |
| abstract | Using a resin composition containing a resin (A) obtained from a monomer having a turbidity of 1 ppm or less according to JIS K0101:1998 using a standard substance as a monomer having a silicon atom, and using an integrating sphere measurement method as a measurement method. By a pattern formation method including a film forming process for forming a film, it is particularly suitable for the formation of ultra-fine patterns (e.g., a line and space pattern having a line width of 50 nm or less, or a hole pattern having a hole diameter of 50 nm or less). In this regard, a pattern formation method capable of remarkably improving scum defect performance, and a method of manufacturing an electronic device using the same are provided. In addition, by the monomer, a monomer for producing a resin for a semiconductor device manufacturing process having the above effect, a resin, a method for producing a resin, an actinic ray-sensitive or radiation-sensitive resin composition, and an actinic ray-sensitive or sensitive Provides a radioactive film. |
| priorityDate | 2015-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 178.