http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102224128-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2019-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102224128-B1 |
| titleOfInvention | Deposition method of carbon thin-film |
| abstract | It relates to a method of depositing a carbon-containing thin film, wherein the method of depositing a carbon-containing thin film according to an embodiment includes exposing a substrate to a precursor in a chamber loaded with a substrate, and in a chamber exposed to the precursor. In, a deposition cycle consisting of purging the precursor, exposing the substrate to a reactive plasma in a chamber in which the precursor is purged, and purging the reactive plasma in a chamber exposed to the reactive plasma, The deposition cycle is repeatedly performed a predetermined number of times, and a carbon-containing plasma treatment is performed in the repeating process to form a carbon-containing thin film whose carbon content is adjusted to a predetermined ratio. |
| priorityDate | 2019-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 75.