http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102209094-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate | 2019-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2021-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102209094-B1 |
titleOfInvention | Plasma reaction apparatus for removing by-products and semiconductor process equpiment |
abstract | The plasma reaction apparatus includes a body, a ground electrode, a dielectric, and a high voltage electrode. The body is installed between the first vacuum tube connected to the process chamber and the second vacuum tube connected to the vacuum pump. The ground electrode is in the form of a basket including a tubular portion having at least one opening and a plate-shaped portion blocking one end of the tubular portion, and is fixed to the inside of the body so that the inner space directly communicates with either of the first vacuum tube and the second vacuum tube. . The dielectric is installed in the body so as to face the tubular portion. The high voltage electrode is located on the outer surface of the dielectric. |
priorityDate | 2019-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.