http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102209094-B1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
filingDate 2019-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102209094-B1
titleOfInvention Plasma reaction apparatus for removing by-products and semiconductor process equpiment
abstract The plasma reaction apparatus includes a body, a ground electrode, a dielectric, and a high voltage electrode. The body is installed between the first vacuum tube connected to the process chamber and the second vacuum tube connected to the vacuum pump. The ground electrode is in the form of a basket including a tubular portion having at least one opening and a plate-shaped portion blocking one end of the tubular portion, and is fixed to the inside of the body so that the inner space directly communicates with either of the first vacuum tube and the second vacuum tube. . The dielectric is installed in the body so as to face the tubular portion. The high voltage electrode is located on the outer surface of the dielectric.
priorityDate 2019-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 26.