| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2018-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2021-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102207893-B1 |
| titleOfInvention |
Semiconductor resist composition, and method of forming patterns using the composition |
| abstract |
The present description relates to a composition for a semiconductor resist including an organometallic compound represented by the following Formula 1 and a solvent, and a pattern forming method using the same. [Formula 1] Specific details for Formula 1 are as defined in the specification. |
| priorityDate |
2018-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |