http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102206663-B1

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filingDate 2019-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_affd1679c89d99a180db2db75d2f965c
publicationDate 2021-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102206663-B1
titleOfInvention Appratus for deposition, Method of depositing using the same, Organic insulating material
abstract The present invention relates to a synthetic resin film forming apparatus for evaporating two or more raw material monomers in a vacuum processing chamber and polymerizing them in a gaseous phase, wherein the vacuum degree of the vacuum processing chamber is set to about 100 to 1 Pa, The raw material monomer is set to a temperature equal to or higher than the highest temperature among the evaporation temperatures of the raw material monomers, and the temperature inside the chamber wall of the vacuum processing chamber is set to a temperature equal to or higher than the temperature of the corresponding gas. The present invention relates to a synthetic resin film forming apparatus comprising a mechanism for evaporating, a mechanism for heating the temperature of the substrate separately provided from the polymerization reaction, and an exhaust mechanism.
priorityDate 2019-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 44.