http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102203303-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-201 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-34 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2014-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102203303-B1 |
| titleOfInvention | Negative-type photosensitive composition curable at low temperature |
| abstract | [Task] Providing a negative-type photosensitive composition capable of low-temperature curing and obtaining a cured film having high transparency and chemical resistance, and a pattern forming method using the same. [Solution means] A negative photosensitive composition comprising a polysiloxane, a (meth)acrylic polymer, a compound containing two or more (meth)acryloyl groups, a polymerization initiator, and a solvent. |
| priorityDate | 2013-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 281.