| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C317-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C317-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D295-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2017-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2020-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102195503-B1 |
| titleOfInvention |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, electronic device manufacturing method |
| abstract |
There is provided an actinic ray-sensitive or radiation-sensitive resin composition that is excellent in storage stability and has a small variation (LWR) in pattern line width when a resist pattern is formed. Further, a resist film, a pattern forming method, and a method of manufacturing an electronic device using the actinic ray-sensitive or radiation-sensitive resin composition are provided. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid represented by the following formula (I) by irradiation with actinic ray or radiation, and a resin. The resist film is formed of an actinic ray-sensitive or radiation-sensitive resin composition. As the pattern formation method and the method of manufacturing an electronic device, an actinic ray-sensitive or radiation-sensitive resin composition is used. |
| priorityDate |
2016-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |