Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F226-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-402 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F226-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 |
filingDate |
2014-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2020-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102190531-B1 |
titleOfInvention |
Resin, photoresist composition, and method for producing photoresist pattern |
abstract |
A resin comprising a structural unit represented by formula (I) and a structural unit having an acid-labile group is provided. Formula I |
priorityDate |
2013-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |