| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68714
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68721
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67259
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687 |
| filingDate |
2019-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2020-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102189980-B1 |
| titleOfInvention |
Substrate processing method and substrate processing apparatus |
| abstract |
The substrate processing method includes a substrate holding step of holding a substrate in a horizontal posture, a chemical solution supplying step of supplying a chemical solution to a main surface of the substrate while rotating the substrate around a vertical rotation axis passing through a central portion of the substrate. , In parallel to the chemical liquid supply process, a treatment height maintenance step of maintaining a cylindrical first guard at a treatment height position for capturing the chemical liquid discharged from the substrate, and after the treatment height maintenance step, in parallel to the chemical liquid supply step And a cleaning height maintenance step of maintaining the first guard at a cleaning height position set below the processing height position. |
| priorityDate |
2018-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |