| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_799858790a0d932d2bf525d1f2324ad6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2019-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_432e739afda90d4fa4a4681d2878720e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_418dc085b56d9139f2f69edf33439dd3 |
| publicationDate |
2020-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102172590-B1 |
| titleOfInvention |
Apparatus for treating substrate |
| abstract |
A substrate processing apparatus is provided. The substrate processing apparatus includes a process chamber that provides a processing space for a substrate, a substrate support part disposed below the processing space to support the substrate, and a process gas disposed above the processing space and containing hydrogen plasma as the substrate. It includes a showerhead for spraying, and a plasma prevention layer is provided on an inner surface of the process chamber to prevent penetration of the hydrogen plasma into the process chamber. |
| priorityDate |
2019-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |