http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102157641-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-582 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2015-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102157641-B1 |
| titleOfInvention | Chemically amplified photosensitive resist composition and insulation layer prepared from the same |
| abstract | The present invention relates to a chemically amplified photosensitive resin composition and an insulating film prepared therefrom, and more particularly, (a-1) a resin in which at least part of a phenolic hydroxyl group or carboxyl group is protected by an acid-decomposable group, (a-2) (A) binder resin containing an acrylic resin containing an epoxy group and (a-3) an acrylic resin containing an oxetane group; (B) mine generator; And (C) a chemically amplified photosensitive resin composition capable of obtaining an insulating film having excellent developability, improved sensitivity, pattern transmittance and slope, and secured stability over time by including a solvent, and an insulating film prepared therefrom. will be. |
| priorityDate | 2015-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 278.