http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102157278-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2015-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102157278-B1 |
| titleOfInvention | Cleanig composition for photoresist |
| abstract | The present invention relates to a cleaning liquid composition for photoresist removal, and more particularly, comprises at least one compound of a fluorine-based compound, an organic technology phonic acid, and an organic solvent, and the organic solvent is sulfolane or N-ethylpyrroly By including at least one compound of N-ethylpyrrolidone, it has excellent removal power to the photoresist, and the antireflection coating formed on or under the photoresist can be easily removed. In addition, the present invention relates to a cleaning solution composition for removing photoresist that can minimize damage to a lower silicon oxide film while removing the etching residue, and a method of manufacturing a semiconductor substrate using the same. |
| priorityDate | 2015-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 65.