http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102149152-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-286 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13398 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 |
| filingDate | 2013-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102149152-B1 |
| titleOfInvention | Photosensitive resin composition for photo spacer, and photo spacer |
| abstract | There is provided a photosensitive resin composition for photo spacers having excellent substrate adhesion, capable of forming a photo spacer having a high elastic recovery rate and high breaking strength, and having less development residue. The photosensitive resin composition for a photo spacer of the present invention, as a binder polymer, includes an acrylic resin having a repeating unit having a cyclic structure in a main chain and a repeating unit having two or more oxyalkylene groups in a side chain. In one embodiment, the photosensitive resin composition for photo spacers of the present invention comprises a polyfunctional monomer, a first photoinitiator having a maximum absorption wavelength at a wavelength of 290 nm to 380 nm, and a second photopolymerization initiator having a maximum absorption wavelength at a wavelength of 230 nm to 290 nm. It further includes a photoinitiator. |
| priorityDate | 2012-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 212.