http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102149136-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102149136-B1 |
| titleOfInvention | Developing solution and development processing method of photosensitive resin composition |
| abstract | [Problem] A developer for a polyimide precursor that can increase the development margin, does not decrease the film thickness of the polyimide resin film well in the development process, and has high safety, and a method for developing a photosensitive polyimide resin composition using this developer , And a pattern formation method using this developing treatment method. [Solution] The developer for a polyimide precursor according to the present invention contains (a) N,N,N',N'-tetramethylurea and (b) a lower alcohol having 1 to 5 carbon atoms. A method for developing a photosensitive polyimide resin composition according to the present invention includes a step of developing a photosensitive polyimide precursor resin composition in which at least a portion of the photosensitive polyimide resin composition has been exposed with the developer solution for a polyimide precursor. The pattern formation method according to the present invention includes a forming step of forming a coated film or molded article made of a photosensitive polyimide precursor resin composition, an exposure step of selectively exposing the coated film or molded article, and developing the coated film or molded article after exposure. It includes a developing step developed by a treatment method. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100376759-B1 |
| priorityDate | 2013-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 139.