| abstract |
In the sputtering target composed of an oxide sintered body containing an indium element, a tin element, and a zinc element, the oxide sintered body is a hexagonal crystal layered compound represented by In 2 O 3 (ZnO) m , and InXO 3 (ZnO) n At least one selected from a hexagonal crystal layered compound, a rutile structure represented by SnO 2 and an ilmenite structure compound represented by ZnSnO 3 , and a spinel structure compound represented by Zn 2 SnO 4 , and an aggregate of the spinel structure compound Sputtering target less than 5% of the total. (In the formula, X is a metal element capable of forming a hexagonal layered compound together with an indium element and a zinc element, m is an integer of 1 or more, and n is an integer of 1 or more.) |