http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102135229-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02521 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45514 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02293 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2013-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102135229-B1 |
| titleOfInvention | Epitaxial chamber with customizable flow injection |
| abstract | An apparatus for processing a substrate in a process chamber is provided herein. In some embodiments, a gas injector for use in a process chamber comprises: a first set of discharge ports providing an inclined injection of a first process gas at an angle to a flat surface; And a second set of discharge ports proximate the first set of discharge ports and providing pressurized laminar flow of the second process gas substantially along the flat surface, the flat surface perpendicular to the second set of discharge ports Is extended. |
| priorityDate | 2012-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.