http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102130135-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D221-14 |
| filingDate | 2017-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102130135-B1 |
| titleOfInvention | Multi function photoacid generator and photoresist composition for thick layer comprising the same |
| abstract | The present invention relates to a photo-acid generator and a chemically amplified photoresist composition for a thick film comprising the same, wherein the photo-acid generator has excellent solubility and sensitivity in addition to its effect as a photo-acid generator, and also has excellent anti-corrosion effect. Therefore, the chemically amplified photoresist composition for a thick film containing the photoacid generator has an effect of reducing scum and/or footing on the exposed portion after development. |
| priorityDate | 2017-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 86.