http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102122612-B1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2252 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2254 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 |
filingDate | 2013-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102122612-B1 |
titleOfInvention | Conformal doping via plasma activated atomic layer deposition and conformal film deposition |
abstract | Methods of doping a patterned substrate in a reaction chamber are disclosed herein. The methods may include forming a first conformal film layer having a dopant source comprising a dopant, and driving a portion of the dopant into the substrate to form a conformal doping profile. In some embodiments, forming the first film layer includes introducing a dopant precursor into the reaction chamber, adsorbing the dopant precursor under conditions to form the adsorption limiting layer, and forming a dopant source. And reacting the adsorbed dopant precursor. In addition, the apparatus for doping the substrate may include a controller having a reaction chamber, a gas inlet, and machine readable code, the controller having instructions to operate the gas inlet to introduce and adsorb the dopant precursor, and Disclosed herein are devices for doping the substrate, including instructions for reacting the adsorbed dopant precursor to form a film layer containing a dopant source. |
priorityDate | 2012-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 93.