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filingDate 2013-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102120509-B1
titleOfInvention Composite substrate manufacturing method, and composite substrate
abstract After the semiconductor substrate 1 and the supporting substrate 3 are bonded together, the composite substrate is manufactured by thinning the semiconductor substrate 1 to obtain a composite substrate 8 having a semiconductor layer 6 on the supporting substrate 3 As a method, a coating film 4a containing polysilazane is formed on a surface to which the supporting substrate 3 is bonded, and a silicon-containing insulating film is subjected to a firing treatment to heat the coating film 4a to 600°C or more and 1200°C or less. (4) is formed, and thereafter, the semiconductor substrate 1 and the supporting substrate 3 are pasted together through the insulating film 4, thereby suppressing poor bonding due to surface roughness and defects of the supporting substrate and simplifying the composite substrate. Get
priorityDate 2012-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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