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filingDate 2013-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102113738-B1
titleOfInvention Stripper composition for photoresist and method for manufacturing of display device using the same
abstract The stripper composition for photoresists according to an embodiment of the present invention is characterized by including hexamethyldisilazane and alkoxysilane as a fluorine-based solvent and solubilizer.
priorityDate 2013-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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