http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102095363-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4485 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate | 2017-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102095363-B1 |
| titleOfInvention | Deposition equipment for parylene with |
| abstract | The present invention can self-clean the by-products generated in the thermal decomposition process of parylene without separate equipment decomposition, and can improve the speed of the deposition process through a parallel structure, as well as the entire thermal decomposition in the self-cleaning process of the pyrolysis device. Regarding the parylene deposition equipment that does not stop the flow of the process, the vaporization unit for vaporizing the parylene (parylene) raw material in the gas phase, and a thermal decomposition unit for thermally decomposing the parylene gas vaporized in the vaporization unit in a vaporizable state, It includes a deposition unit for depositing the parylene gas thermally decomposed in the thermal decomposition unit to the deposited material, the thermal decomposition unit is capable of self-cleaning to remove the by-product by injecting a reactant reacting with the by-product generated in the thermal decomposition process of the parylene gas Parylene deposition equipment is disclosed. |
| priorityDate | 2017-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.