http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102081871-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02293 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
filingDate | 2017-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102081871-B1 |
titleOfInvention | Apparatus for Epitaxial growth |
abstract | An embodiment is an epitaxial growth apparatus, comprising: a chamber, a susceptor having a top surface installed inside the chamber, on which the wafer is mounted, disposed on top of the susceptor, the heat required to grow an epitaxial layer on the wafer. A heater to supply and a reflector disposed above the susceptor, the reflector reflecting heat emitted from the heater so that the wafer has a uniform temperature distribution, wherein the reflector includes a cylindrical main body and a lower part of the main body. A first reflecting member extending from the reflector to the inside of the reflector and disposed on the wafer in a horizontal direction. It may include a second reflecting member extending from a lower portion of the main body portion, inclined toward the center toward the wafer and a third reflecting member disposed in a vertical direction from one end of the second reflecting member. |
priorityDate | 2017-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.