Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-34 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D187-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G81-024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D151-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L87-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08B37-0057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08B37-0006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F251-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G81-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G81-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D151-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 |
filingDate |
2016-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2020-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102079018-B1 |
titleOfInvention |
Self-organizing composition for pattern formation and pattern formation method |
abstract |
An object of the present invention is to provide a patterning self-organizing composition capable of forming a good phase-separated structure even when a pattern having a large size is formed. Moreover, an object of this invention is to provide the self-organizing composition for pattern formation which can form a pattern by a simple process, without needing an underlayer etc. when forming a fine pattern structure. The present invention provides a polymerizing unit (a) comprising at least one unit selected from glucose units and xylose units at least two units and at least one unit selected from aromatic ring-containing units, silicon-containing units and metal-containing units at least two units. It is related with the self-organizing composition for pattern formation characterized by containing the block copolymer containing the superposition | polymerization part (b) containing. |
priorityDate |
2015-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |