http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102078430-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033 |
| filingDate | 2015-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102078430-B1 |
| titleOfInvention | Phase shift mask blank and its manufacturing method, and method for manufacturing phase shift mask |
| abstract | Manufacture of a phase shift mask which has a phase shift mask blank which can pattern a phase shift film in the cross-sectional shape which can fully exhibit a phase shift effect by wet etching, its manufacturing method, and a phase shift film pattern which can fully exhibit a phase shift effect. Provide a method. The phase shift mask blank 1 has a structure in which the phase shift film 3 containing metal, silicon, oxygen, and / or nitrogen was formed on the transparent substrate 2. The phase shift film 3 has the main layer 3a and the outermost surface layer 3b which consist of the same material. The refractive index in wavelength 365nm above the main layer on the outermost surface layer 3b side is smaller than the refractive index in wavelength 365nm below the main layer on the transparent substrate 2 side. |
| priorityDate | 2014-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.