http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102077618-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K8-528 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2012-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102077618-B1 |
| titleOfInvention | Metal-passivating cmp compositions and methods |
| abstract | The present invention provides chemical-mechanical polishing (CMP) compositions and methods for polishing copper- and / or silver-containing substrates. The composition of the present invention comprises a particulate abrasive, a first film-forming metal-complexing agent and a second film-forming passivation agent in an aqueous carrier. Also disclosed is a method of polishing a substrate using the composition of the present invention. |
| priorityDate | 2011-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 88.