http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102076000-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7682 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02277 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02527 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02115 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26 |
| filingDate | 2013-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102076000-B1 |
| titleOfInvention | Flowable carbon for semiconductor processing |
| abstract | Methods for forming flowable carbon layers on a semiconductor substrate are described. To form a flowable carbon-containing film on a substrate, a hydrocarbon-containing silicon-free carbon-containing precursor, as described herein, may be used for local excitation (eg, hot wire). Hot filament in CVD, plasma in PECVD, or UV light) may be applied. The remote excitation method also generates flowable carbon-containing films by exciting a stable precursor to produce radical precursors that are subsequently bonded in the substrate processing region with non-excited silicon-free precursors. Was found. |
| priorityDate | 2012-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 92.