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filingDate 2015-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102075276-B1
titleOfInvention Manufacturing Method of Substrate Processing Apparatus and Semiconductor Device
abstract Provided is a technique capable of reducing the occupied area of the device. It is provided with the storage chamber provided with the loading shelf which mounts the storage container which accommodates a board | substrate, the conveyance mechanism which is provided in the ceiling part of a storage chamber, grips and conveys the upper part of a storage container, and the port which carries in and out a storage container with respect to a storage chamber is provided. The port has an adjustment plate fixed on the base, a stage on which the storage container is stacked, and a horizontal drive mechanism provided at an upper portion of the adjustment plate, connected to the rear surface of the stage via a connecting member, and horizontally moving the stage. The horizontal drive mechanism is constituted by a pair of guide portions whose ends are connected to each other and a first drive portion which is provided between the guide portions and presses the connecting portions of the guide portions.
priorityDate 2015-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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