| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2303-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-328
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-326
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2305-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-3227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-001 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-722
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-325 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F103-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-70 |
| filingDate |
2012-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2020-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102074114-B1 |
| titleOfInvention |
Method and system for providing ultrapure water |
| abstract |
Methods and systems for providing ultrapure water for semiconductor manufacturing operations are provided. The ultrapure water is treated by using a free radical collection system and a free radical removal system. The free radical collection system may utilize actinic radiation with free radical precursor compounds such as ammonium persulfate. The free radical removal system may include the use of a reducing agent. The ultrapure water can be further treated by using ion exchange media and degassing apparatus. Control systems can be used to control the addition of precursor compounds to the ultrapure water, the intensity of actinic radiation, and the addition of reducing agents. |
| priorityDate |
2011-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |