Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02049 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
filingDate |
2017-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2020-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102072531-B1 |
titleOfInvention |
Processing method, method of manufacturing semiconductor device, substrate processing apparatus and program |
abstract |
Treating the substrate held in the substrate holding region of the substrate holding portion including the heat insulating region on one end side and the substrate holding region on the other end side at a first temperature in the processing chamber; A first cleaning step of supplying a cleaning gas to the heat insulation region at a second temperature lower than the first temperature and higher than the room temperature after the substrate held in the substrate holding portion is carried out; And a second cleaning step of supplying a cleaning gas to the substrate holding region at a third temperature lower than the second temperature after carrying out the substrate held by the substrate holding portion. |
priorityDate |
2016-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |