http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102070323-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 |
filingDate | 2016-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102070323-B1 |
titleOfInvention | Etching Composition |
abstract | The present invention is hydrogen peroxide; Cyclic or aromatic compounds containing any one or two or more selected from oxygen, sulfur and nitrogen in the molecule; Aminocarboxylic or amino phosphate compounds; Any one or two or more compounds selected from organic acids, inorganic acids or salts thereof; Undercut inhibitors; And it relates to an etchant composition comprising an alkylamine comprising C 4 or more. In the etching liquid composition of the present invention, the etching process is stable by controlling overetching at the interface between the copper and molybdenum films during etching porosity, thereby improving the etching characteristics. |
priorityDate | 2016-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 163.