| abstract |
The photoacid generator compound of the present invention has the formula (1) Wherein a, b, c, d, e, x, L 1 , L 2 , L 3 , L 4 , R 1 , R 2 , X, and Z − are as defined herein. The photoacid generator compounds exhibit excellent stability in solvents and negative tone developers commonly used to formulate photoresist compositions. Described herein are photoresist compositions comprising a photoacid generator compound, coated substrates comprising the same, and methods of forming devices using the photoresist compositions. |