| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-1422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-3142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-3424
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D165-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2020-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102066229-B1 |
| titleOfInvention |
Under-layer composition of resist and method for forming pattern using the the same |
| abstract |
Disclosed are a resist underlayer film composition having excellent thermal stability and etching resistance as well as excellent gap fill characteristics and a pattern forming method using the same. The resist underlayer film composition may include an aromatic ring-containing polymer including a repeating unit represented by Formula 1 below; A compound represented by Formula 4; And organic solvents. [Formula 1] In Formula 1, R 1 is a monocyclic or polycyclic aromatic hydrocarbon group having 5 to 20 carbon atoms, R 2 and R 3 are each independently a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 14 carbon atoms, a is an integer from 1 to 3 and b is an integer from 0 to 2; [Formula 4] In Formula 4, n is an integer of 1 to 250 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102148772-B1 |
| priorityDate |
2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |