| abstract |
The composition for film formation is a solution of pH 4-10 which contains the aromatic compound which has an amino group and an aromatic ring in 1 molecule, the polybasic acid which has two or more carboxyl groups, and an oxidizing agent. As the oxidizing agent, hypochlorous acid, chlorous acid, chloric acid, perchloric acid, persulfate, percarbonate, hydrogen peroxide, organic peroxide and the like are used. It is preferable that an aromatic compound contains the nitrogen-containing aromatic ring, and it is preferable to have a primary amino group or a secondary amino group. The composition for film formation is used for formation of a film on the surface of a metal member, for example. |