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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-265
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filingDate 2013-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102031577-B1
titleOfInvention Ion implantation system for processing substrate and method of processing substrate
abstract Techniques for processing a substrate can be realized with an ion implantation system that includes an ion source having an ion source chamber. The ion source chamber has a wall defining the ion generating region and an extraction opening from which ions within the ion generating region are extracted. The extraction system is located downward of the ion source near the extraction opening. The material source includes a first source containing a first material, a second source containing a second material, and first and second conduits, wherein the first conduit transfers the first material from the first source to the ion source chamber. In communication with the first source and the ion source chamber to provide, the second conduit may be in communication with the second source. The first region outside the ion source chamber provides a second material from the second source to the first region.
priorityDate 2012-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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