| abstract |
This invention provides the liquid composition used for the etching of a multilayer film containing copper and molybdenum, the etching method of the etching of a multilayer film containing copper and molybdenum, and a board | substrate. In the present invention, (A) maleic acid ion source, (B) copper ion source, and (C) 1-amino-2-propanol, 2- (methylamino) ethanol, 2- (ethylamino) ethanol, 2- ( Butylamino) ethanol, 2- (dimethylamino) ethanol, 2- (diethylamino) ethanol, 2-methoxyethylamine, 3-methoxypropylamine, 3-amino-1-propanol, 2-amino-2- At least one member selected from the group consisting of methyl-1-propanol, 1-dimethylamino-2-propanol, 2- (2-aminoethoxy) ethanol, morpholine, and 4- (2-hydroxyethyl) morpholine A liquid composition containing an amine compound and having a pH value of 4 to 9 is used. |