http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102008026-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1313 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-52 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2013-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102008026-B1 |
| titleOfInvention | Resist composition, method of forming resist pattern and polymeric compound |
| abstract | Provided is a resist composition having excellent lithography properties, a resist pattern forming method, and a high molecular compound. A resist composition in which an acid is generated by exposure and the solubility in a developing solution is changed by the action of an acid, and the base component (A) in which the solubility in the developing solution is changed by the action of an acid is contained, and the base component (A ) Is a structural unit (a0) and an acid derived from monomers having a holding time shorter than β- (methcroyl) oxy-γ-butyrolactone in an analysis according to a high performance liquid chromatography (HPLC) method using a reverse phase column. The resist composition which has a structural unit (a1) containing an acid-decomposable group whose polarity increases by the effect | action, and has a softening point of 130 degreeC or more (A1). |
| priorityDate | 2012-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 340.