| abstract |
The curable composition for imprints which can make improvement of mold release property and suppression of the generation | occurrence | production of the undulation at the time of an etching, and the hardened | cured material, the pattern formation method, the lithographic method, the pattern and the mask for lithography using the said curable composition for imprint are provided. The curable composition for imprints which contains at least one of a monofunctional polymeric compound, an alicyclic structure, and an aromatic ring structure, and has a viscosity in 25 degreeC of 150 mPa * s or less, and a photoinitiator, Comprising: 5-30 mass% of functional polymerizable compounds are contained with respect to all the polymeric compounds in the curable composition for imprints, The cured film of the said curable composition for imprints has an elasticity modulus of 3.5 GPa or less, and also the glass transition temperature of imprint of 90 degreeC or more. Curable composition. |