http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102004073-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1852 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-3025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-1809 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0079 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate | 2016-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102004073-B1 |
| titleOfInvention | METHOD OF FORMING A PATTERN, PROCESSED SUBSTRATE, OPTICAL COMPONENT, CIRCUIT BOARD, |
| abstract | Disposing a photocurable composition on the substrate; Contacting a mold having an uneven pattern with the composition; Irradiating the photocurable composition with light to form a cured film; Releasing the mold from the cured film; Forming an inversion layer on the cured film having the concavo-convex pattern transferred from the mold; Removing a portion of the inversion layer to expose a convex portion of the pattern in a manner that the inversion layer remains in a concave portion of the pattern formed in the cured film; And a step of forming an inverse layer pattern by etching the photo-curing composition using the inversion layer remaining in the concave portion as a mask, wherein the mold is formed in a soluble gas atmosphere having solubility in the composition Contacting the photocurable composition; The soluble gas has a saturation solubility of at least 38 vol%. |
| priorityDate | 2015-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 161.