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filingDate 2017-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102000829-B1
titleOfInvention Thin Film Transistor Including a High-k Insulating Thin Film and Method for Manufacturing The Same
abstract A gate insulating film, a semiconductor layer, a source electrode, and a drain electrode on the substrate, the gate insulating film is a ternary ternary high-valent material A 2- X B X O 3 , A is aluminum, silicon, gallium B is selected from the group consisting of yttrium, lanthanum, zirconium, hafnium, tantalum, titanium, vanadium, nickel, silicon, and ytterbium, and B is any one selected from the group consisting of germanium, neodymium, gadolinium, vanadium, And A and B are different elements, and a method of manufacturing the same. The gate insulating film can be formed through a solution process, and a high-quality insulating film can be obtained by a low-temperature heat treatment.
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type http://data.epo.org/linked-data/def/patent/Publication

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